In this episode of “A Mott Minute,” Alen Uvalic, Director of the Semiconductor Innovation Center at Mott Corporation, explains how our low differential pressure (DP) filters improve gas delivery and process stability in semiconductor manufacturing.
Mott’s advanced metal fiber technology delivers filter densities as low as 6%, with 94% open area for maximum flow and minimal resistance — while maintaining capture efficiency down to 1.5 nanometers.
- Flaw Prevention: Reduces flashing, bubble formation, and unstable flow.
- High Efficiency: Maintains uniform gas delivery for deposition and precursor processes.
- Process Reliability: Designed for consistent performance under extreme pressure and temperature.
Our engineered filtration solutions help semiconductor fabs achieve cleaner processes, higher yield, and lower defect rates.